literature
Literature
Authors
Jobs
Seminars
Conferences
DataBETA

Direction for the Future - Successive Acceleration of Positive and Negative Ions Applied to Space Propulsion

Dec 16, 2013
10 pages
Contribution to:
  • Published: Dec 16, 2013
e-Print:
DOI:
View in:
pdf
reference search0 citations

Citations per year

0 Citations
Abstract: (arXiv)
Electrical space thrusters show important advantages for applications in outer space compared to chemical thrusters, as they allow a longer mission lifetime with lower weight and propellant consumption. Mature technologies on the market today accelerate positive ions to generate thrust. The ion beam is neutralized by electrons downstream, and this need for an additional neutralization system has some drawbacks related to stability, lifetime and total weight and power consumption. Many new concepts, to get rid of the neutralizer, have been proposed, and the PEGASES ion-ion thruster is one of them. This new thruster concept aims at accelerating both positive and negative ions to generate thrust, such that additional neutralization is redundant. This chapter gives an overview of the concept of electric propulsion and the state of the development of this new ion-ion thruster.
Note:
  • 10 pages, contribution to the CAS-CERN Accelerator School: Ion Sources, Senec, Slovakia, 29 May - 8 June 2012, edited by R. Bailey. appears in CERN Yellow Report CERN-2013-007, pp.575-584
  • [1]
    Technology of closed-drift thrusters
    • H.R. Kaufman
      • AIAA J. 23 (1985) 78-87
  • [2]
    Fundamentals of Electric Propulsion: Ion and Hall Thrusters (JPL Space Science and Technology Series Hoboken, NJ,)
    • D.M. Goebel
      ,
    • I. Katz
  • [3]
    Trans. Jpn. Soc. Aeronaut. Space Sci., Aerosp. Technol. Jpn. 10 Tb-1
    • N. Kazutaka
      ,
    • H. Kuninaka
  • [4]
    Electric propulsion using ion-ion plasmas
    • A. Aanesland
      ,
    • A. Meige
      ,
    • P. Chabert
      • J.Phys.Conf.Ser. 162 (2009) 01
  • [5]
    Development and transportation costs of space launch systems. Presented at the DGLR/CEAS European Air and Space Conference
    • R. Janovsky
      ,
    • D.E. Koelle
  • [6]
    Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technology
    • H.R. Kaufman
      • J.Vac.Sci.Tech. 21 (1982) 725
  • [7]
    Global model of a gridded-ion thruster powered by a radiofrequency inductive coil
    • P. Chabert
      ,
    • J. Arancibia Monreal
      ,
    • J. Bredin
      ,
    • L. Popelier
      ,
    • A. Aanesland
      • Phys.Plasmas 19 (2012) 073512
  • [8]
    Physics of Radio-Frequency Plasmas (Cambridge University Press, Cambridge,)
    • P. Chabert
      ,
    • N.S.J. Braithwaite
  • [9]
    Electrical and plasma parameters of ICP with high coupling efficiency. Plasma Sources
    • V.A. Godyak
      • Sci.Technol. 20 (2011) 025004
  • [10]
    Electron energy distribution function and plasma parameters across magnetic filters
    • A. Aanesland
      ,
    • J. Bredin
      ,
    • P. Chabert
      ,
    • V.A. Godyak
      • Appl.Phys.Lett. 100 (2012) 044102
  • [11]
    Yu.I Dimov, and V.G. Dudnikov, A powerful injector of neutrals with a surfaceplasma source of negative ions
    • G.I. Belchenko
      • Nucl.Fusion 14 (1974) 113
  • [12]
    Physics aspects of negative ion sources
    • M. Bacal
      • Nucl.Fusion 46 (2006) S250-S259
  • [13]
    Total cross sections for ionization and attachment in gases by electron impact. II. Negative-ion formation
    • D. Rapp
      ,
    • D.D. Briglia
      • J.Chem.Phys. 43 (1965) 1480
  • [14]
    Principles of Plasma Discharges and Materials Processing. (2nd ed.) -
    • M.A. Lieberman
      ,
    • A.J. Lichtenberg
  • [15]
    Langmuir probe analysis of highly electronegative plasmas
    • J. Bredin
      ,
    • P. Chabert
      ,
    • A. Aanesland
      • Appl.Phys.Lett. 102 (2013) 154107
  • [16]
    Method and device for forming a plasma beam. Patent WO/042143 A1
    • A. Aanesland
      ,
    • P. Chabert
      ,
    • M. Irzyk
      ,
    • S. Mazouffre
  • [17]
    Particle-in-cell simulation of an electronegative plasma under direct current bias studied in a large range of electronegativity
    • N. Oudini
      ,
    • J.-L. Raimbault
      ,
    • P. Chabert
      ,
    • A. Meige
      ,
    • A. Aanesland
      • Phys.Plasmas 20 (2013) 043501
  • [18]
    Low temperature plasmas exposed to external magnetic and electric fields. Habilitation à Diriger des Recherches, Université Pierre et Marie Curie
    • A. Aanesland
  • [19]
    Model of plasma immersion ion implantation
    • M.A. Lieberman
      • J.Appl.Phys. 66 (1989) 2926
  • [20]
    Plasma immersion ion implantation for semiconductor processing
    • N. Cheung
      • Mater.Chem.Phys. 46 (1996) 132-139
  • [21]
    Influence of thickness and dielectric properties on implantation efficacy in plasma immersion ion implantation of insulators
    • R.K.Y. Fu
      • J.Appl.Phys. 95 (2004) 3319