Production and Secondary Electron Yield Test of Amorphous Carbon Thin Film

Zhang, Yuxin; Ge, Xiaoqin; Wang, Siwei; Wang, Yong; Wei, Wei; Zhang, Bo

doi:10.18429/JACoW-IPAC2018-THPML128

Production and Secondary Electron Yield Test of Amorphous Carbon Thin Film

Jun, 2018

3 pages

Contribution to:

- IPAC 2018

Published: Jun, 2018

DOI:

10.18429/JACoW-IPAC2018-THPML128

pdf

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Abstract: (JACoW)

Amorphous carbon (a-C) thin film applied to vacuum chambers of high-energy particle accelerators can decrease secondary electron yield（SEY）and suppress electron-cloud effectively. A dc magnetron sputtering apparatus to obtain a-C film has been designed. With the equipment, a-C thin film can be deposited on the inner face of stainless steel pipes ultimately which is uniform and high-quality. Meanwhile, it is found that a-C has a low SEY＜1.2 measured by the secondary electron emission measurement set-up in the National Synchrotron Radiation Laboratory. The result indicates that a-C is an ideal material for modern accelerators.

electron
vacuum
synchrotron
synchrotron-radiation
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References(6)

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